ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,793, issued on Aug. 11, was assigned to Tokyo Electron Ltd. (Tokyo).
"Processing liquid supply apparatus and processing liquid supply method" was invented by Kazuya Hashimoto (Koshi City, Japan) and Hikaru Akada (Koshi City, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A processing liquid supply apparatus for supplying a processing liquid to a substrate processing apparatus including a liquid processing module configured to process a substrate with the processing liquid, comprising: a transfer region where a transfer mechanism configured to hold and transfer a container storing the processing liquid is provided, and a pair of supply regions ...