US Patent Issued to Tokyo Electron on April 7 for "Substrate transfer apparatus and substrate transfer method" (Japanese Inventor)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,957, issued on April 7, was assigned to Tokyo Electron Ltd. (Tokyo).

"Substrate transfer apparatus and substrate transfer method" was invented by Wataru Matsumoto (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A substrate transfer method for transferring a substrate using a first transfer body and at least one second transfer body comprises transferring the substrate using the first transfer body to a predetermined first substrate reference position in a module, receiving the substrate at the first substrate reference position using the second transfer body, and transferring the substrate to a detection device by moving the second ...