US Patent Issued to Tokyo Electron on April 21 for "Semiconductor manufacturing apparatus and manufacturing method for semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,609,285, issued on April 21, was assigned to Tokyo Electron Ltd. (Tokyo).

"Semiconductor manufacturing apparatus and manufacturing method for semiconductor device" was invented by Taro Ikeda (Yamanashi, Japan), Satoru Kawakami (Yamanashi, Japan) and Hiroyuki Miyashita (Yamanashi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor manufacturing apparatus includes: a processing container that accommodates a substrate holder that holds a plurality of substrates in a shelf shape; a gas supply that supplies a processing gas into the processing container; and a microwave introducer that generates a plasma from the processing gas. The microw...