ALEXANDRIA, Va., April 15 -- United States Patent no. 12,604,696, issued on April 14, was assigned to Tokyo Electron Ltd. (Tokyo).
"Liquid processing method, liquid processing apparatus, and storage medium" was invented by Takahiro Takumi (Kumamoto, Japan) and Takeshi Shimoaoki (Kumamoto, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A liquid processing method includes: a substrate processing process for allowing a processing liquid to flow through a flow path connecting a reservoir and a processing liquid supply, and be discharged to a substrate from the processing liquid supply, thereby processing the substrate; a stay process for filling the flow path with a liquid and keeping the liquid stay in th...