US Patent Issued to TOKUYAMA on Oct. 14 for "Semiconductor wafer processing liquid containing hypobromite ions and PH buffering agent" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,444,617, issued on Oct. 14, was assigned to TOKUYAMA Corp. (Yamaguchi, Japan).

"Semiconductor wafer processing liquid containing hypobromite ions and PH buffering agent" was invented by Takafumi Shimoda (Yamaguchi, Japan), Yuki Kikkawa (Yamaguchi, Japan), Tomoaki Sato (Yamaguchi, Japan) and Takayuki Negishi (Yamaguchi, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a treatment liquid for treating a semiconductor wafer in a semiconductor forming process, the treatment liquid containing (A) a hypobromite ion, (B) a pH buffer, and (C) an onium ion represented by formula (1):(wherein R1, R2, R3, and R4 each independently denote an alkyl gr...