ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,538,727, issued on Jan. 27, was assigned to TOKUYAMA Corp. (Yamaguchi, Japan).
"Treatment liquid for semiconductor with ruthenium" was invented by Tomoaki Sato (Yamaguchi, Japan), Yuki Kikkawa (Yamaguchi, Japan), Takafumi Shimoda (Yamaguchi, Japan) and Takayuki Negishi (Yamaguchi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a treatment liquid for a semiconductor with ruthenium including a ligand which coordinates to ruthenium, the treatment liquid is a treatment liquid for inhibiting a ruthenium-containing gas generated when contacting a semiconductor wafer including ruthenium with the treatment liquid in a semiconductor forming pro...