US Patent Issued to TOFLO on Sept. 15 for "Flow rate control device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,736,150, issued on Sept. 15, was assigned to TOFLO Corp. (Tokyo).

"Flow rate control device" was invented by Takahiro Kawamoto (Tokyo), Hiroyoshi Amano (Tokyo), Taichi Baba (Tokyo) and Kurumi Chino (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a flow rate control device capable of suppressing variation of supply pressure caused by variation of set flow rate and suppressing influence of pressure loss and cavitation on a secondary side. The flow rate control device includes: a flow rate regulating valve that regulates a flow rate of fluid flowing in a flow path; a flow meter that measures the flow rate of the fluid flowing in the flow...