ALEXANDRIA, Va., March 17 -- United States Patent no. 12,577,431, issued on March 17, was assigned to TOAGOSEI Co. LTD. (Tokyo).
"Dispersant and polishing agent composition" was invented by Akihiro Goto (Aichi, Japan), Sachiko Imura (Aichi, Japan), Shun Nakano (Aichi, Japan) and Ryutaro Tsubouchi (Aichi, Japan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A dispersant for chemical mechanical polishing that flattens a surface of at least one of an insulating layer and a wiring layer includes a block copolymer (P) having a polymer block A and B. The polymer block A has a structural unit derived from at least one monomer selected from the group consisting of an amide group-containing vinyl monomer and an ester...