US Patent Issued to The University of Hong Kong on May 19 for "Event-based auto-exposure for digital photography" (Chinese Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,634,587, issued on May 19, was assigned to The University of Hong Kong (Hong Kong).

"Event-based auto-exposure for digital photography" was invented by Jia Pan (Hong Kong) and Shijie Lin (Hong Kong).

According to the abstract* released by the U.S. Patent & Trademark Office: "An event-guided auto-exposure (EG-AE) device leverages the high dynamic range and low latency properties of a dynamic vision sensor to guide the exposure setting of an active pixel sensor. The method utilizes physical connections of images and events to estimate the irradiance variations, which are fed into the EG-AE device for calculating the exposure setting. The method shows outstanding performance in tackling ...