US Patent Issued to THE TRUSTEES OF PRINCETON UNIVERSITY on May 19 for "Methods for creating large-area complex nanopatterns for nanoimprint molds" (New Jersey Inventors)

ALEXANDRIA, Va., May 19 -- United States Patent no. 12,631,563, issued on May 19, was assigned to THE TRUSTEES OF PRINCETON UNIVERSITY (Princeton, N.J.).

"Methods for creating large-area complex nanopatterns for nanoimprint molds" was invented by Stephen Y. Chou (Princeton, N.J.) and Fei Ding (Princeton, N.J.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Some embodiments of the invention provide methods that can create large area complex patterns for nanoimprint molds without or with very litter of the use of the charged beam or photon beam direct-writing of nanostructures. Some embodiments of the invention use (i) Fourier nanoimprint patterning (FNP), (ii) edge-guided nanopatterning (EGN), and (iii) nanost...