ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,061, issued on March 3, was assigned to The Texas A&M University System (College Station, Texas).

"Systems and methods for inspecting photomasks" was invented by ChaBum Lee (College Station, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for inspecting a photomask includes scanning the photomask with an interferometric fringe pattern generated by an interferometer, generating an interferogram associated with the photomask in response to scanning the photomask using the interferometer, and detecting one or more geometric parameters of the photomask using the generated interferogram."

The patent was filed on Dec. 2, 2022, under Applica...