ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,551,100, issued on Feb. 17, was assigned to The Schepens Eye Research Institute Inc. (Boston).
"Measuring dark adaptation" was invented by Shrinivas Pundlik (Arlington, Mass.) and Gang Luo (Lexington, Mass.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods, systems, and devices are provided for measuring dark adaptation of one or both eyes of a patient, and more particularly, for measuring dark adaptation with a mobile device application. An exemplary method includes exposing an eye of a patient to a light source to bleach a retinal location of the eye, displaying on a mobile device a figure with a luminance and waiting until the patient communicat...