US Patent Issued to The Research Foundation for The State University of New York on Aug. 4 for "Methods for producing n-doped graphene films" (New York Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,698,560, issued on Aug. 4, was assigned to The Research Foundation for The State University of New York (Albany, N.Y.).

"Methods for producing n-doped graphene films" was invented by Matthew Eisaman (Port Jefferson, N.Y.), Jan Folkson (Williston Park, N.Y.) and Joseph Andrade (Stony Brook, N.Y.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided are methods for producing n-doped graphene films. The method comprises contacting a graphene layer with an alkali metal-doped polymer layer. Compositions comprising (i) a substrate, (ii) a doped polymer, and (iii) graphene are also provided. The methods of the invention produce n-doped graphene films that are...