ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,332, issued on Aug. 4, was assigned to THE INSTITUTE OF OPTICS AND ELECTRONICS, THECHINESE ACADEMY OF SCIENCES (Chengdu, China).

"Gap detection system and method, and focal plane correction method" was invented by Xiangang Luo (Chengdu, China), Yanqin Wang (Chengdu, China), Chengwei Zhao (Chengdu, China), Tiancheng Gong (Chengdu, China), Changtao Wang (Chengdu, China), Wenhao Zhang (Chengdu, China), Yiyun Zhang (Chengdu, China) and Yan Tang (Chengdu, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "A gap inspection system is configured to inspect global gap data between mask and substrate, comprising: support frame; mask frame comprising autofocu...