US Patent Issued to TEXAS INSTRUMENTS on Oct. 27 for "Thin film resistor mismatch improvement using a self-aligned double pattern (SADP) technique" (Texas Inventors)

ALEXANDRIA, Va., Oct. 27 -- United States Patent no. 12,777,664, issued on Oct. 27, was assigned to TEXAS INSTRUMENTS Inc. (Dallas).

"Thin film resistor mismatch improvement using a self-aligned double pattern (SADP) technique" was invented by Scott William Jessen (Allen, Texas), Steven Lee Prins (Fairview, Texas), Sameer Prakash Pendharkar (Allen, Texas), Abbas Ali (Plano, Texas) and Gregory Boyd Shinn (Dallas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A passive circuit component includes an edge having a low line edge roughness (LER). A method for manufacturing the passive circuit component includes a self-aligned double patterning (SADP) etch process using a tri-layer process flow. The tri-layer proce...