ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,628, issued on July 7, was assigned to TEXAS INSTRUMENTS Inc. (Dallas).

"Electrical characterization of misalignment in integrated circuit manufacturing" was invented by Hao Yang (Allen, Texas) and John K. Arch (Richardson, Texas).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes performing a fabrication process that fabricates a wafer having an upper region and unit areas arranged in rows along a first direction and columns along an orthogonal second direction and respective scribe streets between adjacent unit areas to: form first and second electrical components on or in the upper region in respective unit areas or scribe streets, th...