ALEXANDRIA, Va., July 7 -- United States Patent no. 12,677,617, issued on July 7, was assigned to TEXAS INSTRUMENTS Inc. (Dallas).
"Cyclic etch-ash process for semiconductor processing" was invented by Gordon Nielsen (Cedar Hills, Utah), Gregory McKee (Riverton, Utah), Aravindsekar Pandiasekar (Draper, Utah) and Michael O'Toole (Salt Lake City).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure generally relates to removing a photoresist in semiconductor processing, and more particularly, to a cyclic etch-ash process for removing a photoresist that may be integrated into an etch process and/or etch processing tool. In an example, while a semiconductor substrate is disposed within a chamber ...