US Patent Issued to TES on Dec. 16 for "Substrate processing apparatus and substrate monitoring method" (South Korean Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,102, issued on Dec. 16, was assigned to TES Co. LTD (Yongin-si, South Korea).

"Substrate processing apparatus and substrate monitoring method" was invented by Jong-Seok Lee (Yongin-si, South Korea), Seung-Min Oh (Yongin-si, South Korea) and In-Il Jung (Yongin-si, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a substrate processing apparatus including a chamber providing a processing space in which a process is performed on a substrate coated with an organic solvent using a fluid in a supercritical state, a tray unit supporting the substrate and provided to be inserted into the chamber and withdraw from the chamber through an...