US Patent Issued to TDK on Aug. 18 for "Strain resistance film, physical quantity sensor, and method for manufacturing the strain resistance film" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,709,787, issued on Aug. 18, was assigned to TDK Corp. (Tokyo).

"Strain resistance film, physical quantity sensor, and method for manufacturing the strain resistance film" was invented by Kohei Nawaoka (Tokyo), Ken Unno (Tokyo), Tetsuya Sasahara (Tokyo), Masanori Kobayashi (Tokyo) and Tetsuo Hata (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A strain resistance film containing a composition represented by Cr100-x-y-zAlxNyOz, satisfying 5less than equal toxless than equal to50, 0.1less than equal toyless than equal to20, 0.1less than equal tozless than equal to17, and y+zless than equal to25."

The patent was filed on Oct. 2, 2023, under Applicati...