ALEXANDRIA, Va., March 3 -- United States Patent no. 12,565,699, issued on March 3, was assigned to TAIYO NIPPON SANSO Corp. (Tokyo).
"Device for supplying a mixed gas, device for producing metal nitride film, and method for producing metal nitride film" was invented by Hayato Murata (Tokyo), Tadaki Mizuno (Tokyo), Keisuke Andachi (Tokyo) and Katsumasa Suzuki (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "One object of the present invention is to provide a method for producing a metal nitride film that has a high film formation rate and excellent productivity. The present invention provides a method for producing a metal nitride film in which a metal nitride film is formed on at least a part of a surf...