US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 8 for "Slurry monitoring device, CMP system and method of in-line monitoring a slurry" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,728,498, issued on Sept. 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Slurry monitoring device, CMP system and method of in-line monitoring a slurry" was invented by Chwen Yu (Taipei City, Taiwan), Ting-Wen Chen (Hsinchu City, Taiwan) and Chi Wen Kuo (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A slurry monitoring device, a CMP system and a method of in-line monitoring a slurry are provided. The slurry monitoring device incudes a slurry metrology cell, a plurality of light sources, at least one optical lens, and at least one optical detector. The slurry metrology cell accommodates a slurry. Th...