US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 8 for "Metal-insulator-metal capacitors and methods of forming the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,733,186, issued on Sept. 8, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Metal-insulator-metal capacitors and methods of forming the same" was invented by Li Chung Yu (Kaohsiung City, Taiwan), Shin-Hung Tsai (Hsinchu City, Taiwan), Cheng-Hao Hou (Hsinchu City, Taiwan), Hsiang-Ku Shen (Hsinchu City, Taiwan), Chen-Chiu Huang (Taichung City, Taiwan) and Dian-Hau Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Semiconductor structures and methods are provided. An exemplary method includes depositing a first conductive material layer over a substrate, patterning the first conductive material layer t...