US Patent Issued to Taiwan Semiconductor Manufacturing on Sept. 29 for "System and method for monitoring vacuum valve closing condition in vacuum processing system" (Taiwanese Inventor)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,748,012, issued on Sept. 29, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"System and method for monitoring vacuum valve closing condition in vacuum processing system" was invented by Pei Cheng Chiu (Hsin-Chu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A system and method for cleaning and inspecting ring frames is disclosed here. In one embodiment, a vacuum valve comprising at least one sealing O-ring; and a pressure monitoring tape on a mating surface on a vacuum processing chamber, wherein the pressure monitoring tape is configured to perform a pressure profile mapping between the mating surface on the vac...