US Patent Issued to Taiwan Semiconductor Manufacturing on Sept. 29 for "System and method for monitoring and controlling extreme ultraviolet photolithography processes" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 30 -- United States Patent no. 12,748,353, issued on Sept. 29, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"System and method for monitoring and controlling extreme ultraviolet photolithography processes" was invented by Tai-Yu Chen (Hsinchu, Taiwan), Heng-Hsin Liu (Hsinchu, Taiwan), Li-Jui Chen (Hsinchu, Taiwan) and Shang-Chieh Chien (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photolithography system utilizes tin droplets to generate extreme ultraviolet radiation for photolithography. The photolithography system irradiates the droplets with a laser. The droplets become a plasma and emit extreme ultraviolet radiation. An array of...