US Patent Issued to Taiwan Semiconductor Manufacturing on Sept. 23 for "Methods for forming pattern layout, mask, and semiconductor structure" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 23 -- United States Patent no. 12,423,496, issued on Sept. 23, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Methods for forming pattern layout, mask, and semiconductor structure" was invented by Chun-Yen Lin (Hsinchu, Taiwan), Tung-Heng Hsieh (Zhudong Town, Taiwan) and Bao-Ru Young (Zhubei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for forming a pattern layout is provided, including receiving an IC design layout including a layout block, a first line pattern is disposed inside the layout block along the first direction; forming a second line pattern disposed outside the layout block parallel to the first line patterns; forming a m...