ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,745,423, issued on Sept. 22, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Semiconductor structure" was invented by Jhon-Jhy Liaw (Zhubei City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor structure includes a circuit cell having transistors. Each of the transistors includes nanostructures vertically stacked from each other, and a gate structure wrapped around the nanostructures and extending in a first direction. The semiconductor structure further includes a dielectric gate structure extending in the first direction and adjacent to the circuit cell in a second direction. The second direct...