US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Sept. 15 for "Defect inspection method and defect inspection system" (Taiwanese Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,736,480, issued on Sept. 15, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Defect inspection method and defect inspection system" was invented by Ching-Yi Lin (Yilan County, Taiwan), To-Yu Chen (Yunlin County, Taiwan), Shao-Chien Chiu (Hsinchu City, Taiwan) and Ting-Han Lin (Hsinchu City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A defect inspection method, an inspection system, and a non-transitory computer-readable storage medium are provided. The defect inspection method includes providing a processed image and a reference image of a wafer, both the processed image and the reference image comprising ...