ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,727,202, issued on Sept. 1, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Integrated circuit and formation method thereof" was invented by Chih-Yang Chen (Hsinchu City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "An integrated circuit and a formation method thereof are provided. The integrated circuit includes first and second gate structures; first and second channel structures, laterally penetrating through the first and second gate structures, respectively; first and second source/drain structures, disposed between the first and second gate structures, and in lateral contact with the first and second channe...