ALEXANDRIA, Va., March 3 -- United States Patent no. 12,568,681, issued on March 3, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Active region patterning" was invented by Chih-Hsin Yang (Hsinchu, Taiwan), Yen-Ming Chen (Hsin-Chu County, Taiwan) and Dian-Hau Chen (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "Semiconductor structures and fabrication processes are provided. A semiconductor according to the present disclosure includes a first region including a first fin, a second fin, and a third fin extending along a first direction, and a second region abutting the first region. The second region includes a fourth fin and a fifth fin extending along the...