US Patent Issued to Taiwan Semiconductor Manufacturing on March 17 for "Photoresist bottle replacement system" (Taiwanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,576,538, issued on March 17, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Photoresist bottle replacement system" was invented by Oliver Yu (Hsinchu, Taiwan), Huei-Chi Chiu (Tainan City, Taiwan), Shi-Ming Wang (Tainan City, Taiwan), Li-Jen Wu (Tainan City, Taiwan), Yu Kai Chen (Kaohsiung City, Taiwan) and Sharon Yang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure describes a method for replacing a photoresist (PR) bottle using a vehicle. An exemplary vehicle includes a processor configured to receive a request signal to replace a first PR bottle. The processor is also configured ...