US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on March 17 for "Photomask and methods for measuring and manufacturing the photomask" (Taiwanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,578,652, issued on March 17, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Photomask and methods for measuring and manufacturing the photomask" was invented by Ping-Hsun Lin (New Taipei City, Taiwan), Chien-Cheng Chen (Hsinchu County, Taiwan), Shih Ju Huang (New Taipei City, Taiwan), Pei-Cheng Hsu (Taipei City, Taiwan), Ta-Cheng Lien (Hsinchu County, Taiwan) and Hsin-Chang Lee (Hsinchu County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes forming a test pattern and a reference pattern in an absorption layer of a photomask structure. The test pattern has a first trench and a second trench, ...