ALEXANDRIA, Va., March 17 -- United States Patent no. 12,581,754, issued on March 17, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method and apparatus to enhance semiconductor device manufacturing" was invented by Yao-Ren Kuo (Hsinchu, Taiwan), Chih-Wei Wen (Hsinchu, Taiwan), Kun-Lung Hsieh (Hsinchu, Taiwan), Tzu Han Liu (Hsinchu, Taiwan) and Hung-Jui Chang (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Pellicles are inspected by projecting a light pattern thereon and monitoring the reflected light by CCD module or the like. Software-based inspection of the reflected pattern recognizes any distortions in the pattern or contamination, and thus identifie...