US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on June 9 for "Method of fin selection for improved performance in semiconductor devices" (Taiwanese Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,652,981, issued on June 9, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method of fin selection for improved performance in semiconductor devices" was invented by Shellin Liu (Hsinchu, Taiwan) and Jui-Tse Tsai (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes receiving an integrated circuit (IC) design layout that includes a design boundary and a pair of design fin patterns having a fin spacing and a fin pitch. The method further includes creating a mandrel mask pattern, which includes determining an edge of the mandrel mask pattern based on a location of the design boundary, the fin ...