US Patent Issued to Taiwan Semiconductor Manufacturing on June 30 for "System and method for supplying and dispensing bubble-free photolithography chemical solutions" (Taiwanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,750, issued on June 30, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"System and method for supplying and dispensing bubble-free photolithography chemical solutions" was invented by Wen-Zhan Zhou (Zhubei City, Taiwan), Heng-Jen Lee (Baoshan Township, Taiwan), Hsu-Yuan Liu (Zhudong Township, Taiwan), Yu-Chen Huang (Toufen Township, Taiwan), Cheng-Han Wu (Taichung City, Taiwan), Shih-Che Wang (Hsin-Chu City, Taiwan) and Ho-Yung David Hwang (Chu Pei City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of supplying a chemical solution to a photolithography system. The chemical solution is pumped from a v...