US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on June 30 for "Storage system for storing photoresist coated substrates" (Taiwanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,669,751, issued on June 30, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Storage system for storing photoresist coated substrates" was invented by Chun-Wei Liao (Taoyuan, Taiwan), Sheng-Wen Jiang (Hsinchu, Taiwan), Jan-Liang Yang (Taichung City, Taiwan) and Hui-Chun Lee (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A storage system for storing photoresist coated semiconductor substrates includes a semiconductor substrate container configured to store a plurality of semiconductor substrates. The storage system further includes a gas inlet, a gas outlet, and a sensor coupled to the gas outlet and co...