US Patent Issued to Taiwan Semiconductor Manufacturing on June 3 for "Etching to reduce line wiggling" (Taiwanese Inventors)

ALEXANDRIA, Va., June 4 -- United States Patent no. 12,322,651, issued on June 3, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Etching to reduce line wiggling" was invented by Kuan-Wei Huang (Taoyuan, Taiwan), Cheng-Li Fan (New Taipei, Taiwan) and Yu-Yu Chen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for reducing wiggling in a line includes forming a first patterning layer over a metal feature and depositing a first mask layer over the first patterning layer. The first mask layer is patterned to form a first set of one or more openings therein and then thinned. The pattern of the first mask layer is transferred to the first patterning layer to ...