ALEXANDRIA, Va., July 15 -- United States Patent no. 12,666,896, issued on June 23, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Vent port diffuser" was invented by Yung-Tsun Liu (Taipei City, Taiwan), Chao-Hung Wan (Taichung City, Taiwan), Kuang-Wei Cheng (Hsinchu City, Taiwan), Chih-Tsung Lee (Hsinchu City, Taiwan) and Chyi-Tsong Ni (Hsinchu City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A chamber of a semiconductor fabrication facility may include a vent port diffuser. The vent port diffuser may include a first tube member configured to couple the vent port diffuser to a vent port of the chamber. The vent port diffuser may include a second tube member couple...