US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on June 16 for "Method of cleaning, support, and cleaning apparatus" (Taiwanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,654,210, issued on June 16, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Method of cleaning, support, and cleaning apparatus" was invented by Yi-Chen Ho (Taichung, Taiwan), Chih Ping Liao (Hsinchu, Taiwan), Ker-Hsun Liao (Hsinchu, Taiwan) and Chi-Hsun Lin (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of cleaning includes placing a semiconductor device manufacturing tool component made of quartz on a support. A cleaning fluid inlet line is attached to a first open-ended tubular quartz projection extending from an outer main surface of the semiconductor device manufacturing tool component. ...