US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on June 16 for "Extreme ultraviolet mask and method of manufacturing the same" (Taiwanese Inventors)

ALEXANDRIA, Va., June 16 -- United States Patent no. 12,656,676, issued on June 16, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Extreme ultraviolet mask and method of manufacturing the same" was invented by Wei-Che Hsieh (Taipei, Taiwan), Tzu-Yi Wang (Hsinchu City, Taiwan), Ping-Hsun Lin (New Taipei City, Taiwan), Ta-Cheng Lien (Cyonglin Township, Taiwan), Hsin-Chang Lee (Hsinchu County, Taiwan) and Huan-Ling Lee (Hsinchu County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method of fabricating a mask is provided. The method includes providing a hard mask layer disposed on top of absorber, a capping layer, and a multilayer that are disposed on a substrate. ...