US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on July 28 for "Inspection tool for an extreme ultraviolet radiation source to observe tin residual" (Taiwanese Inventors)

ALEXANDRIA, Va., July 28 -- United States Patent no. 12,693,603, issued on July 28, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Inspection tool for an extreme ultraviolet radiation source to observe tin residual" was invented by Chiao-Hua Cheng (Tainan City, Taiwan), Sheng-Kang Yu (Hsinchu City, Taiwan), Shang-Chieh Chien (New Taipei City, Taiwan), Wei-Chun Yen (Tainan City, Taiwan), Heng-Hsin Liu (New Taipei City, Taiwan), Ming-Hsun Tsai (Hsinchu City, Taiwan), Yu-Fa Lo (Kaohsiung, Taiwan), Li-Jui Chen (Hsinchu City, Taiwan), Wei-Shin Cheng (Hsinchu City, Taiwan), Cheng-Hsuan Wu (New Taipei City, Taiwan), Cheng-Hao Lai (Taichung City, Taiwan), Yu-Kuang Sun (Hsinchu City, Taiwan) and Yu-Huan Chen (Hs...