US Patent Issued to Taiwan Semiconductor Manufacturing on July 21 for "Charged particle filter and removal system" (Taiwanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,685,950, issued on July 21, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Charged particle filter and removal system" was invented by En Tian Lin (Hsinchu, Taiwan) and Chiao Ling Weng (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure is directed to at least one embodiment of a filter that is configured to remove contaminants utilizing a first conductive mesh (e.g., first electrode) and a second conductive mesh (e.g., second electrode) that extends around the first conductive mesh. For example, the first conductive mesh may receive a first electrical signal and the second conductive m...