US Patent Issued to Taiwan Semiconductor Manufacturing on July 15 for "System and method for selecting photolithography processes" (Taiwanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,360,460, issued on July 15, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"System and method for selecting photolithography processes" was invented by Shih-Ming Chang (Hsinchu, Taiwan), Ken-Hsien Hsieh (Hsinchu, Taiwan) and Yu-Tien Shen (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor processing system includes a first photolithography system and a second photolithography system. The semiconductor processing system includes a layout database that stores a plurality of layouts indicating features to be formed in a wafer. The semiconductor processing system includes a layout analyzer that ana...