US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Jan. 27 for "Photomask having recessed region" (Taiwanese Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,535,730, issued on Jan. 27, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING Co. LTD. (Hsinchu, Taiwan).

"Photomask having recessed region" was invented by Yu-Yu Chen (Taichung, Taiwan) and Chi-Hung Liao (New Taipei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photomask includes a substrate, an opaque filling formed embedded in the substrate, and an opaque main feature over the substrate. The opaque filling has a first width. The opaque main has a second width greater than the first width of the opaque filling. The opaque filling and the opaque main feature comprise same material."

The patent was filed on Sept. 22, 2023, under Application...