ALEXANDRIA, Va., Feb. 3 -- United States Patent no. 12,543,528, issued on Feb. 3, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Contamination control in semiconductor manufacturing systems" was invented by Bo Chen Chen (Hsinchu, Taiwan), Sheng-Wei Wu (Hsinchu County, Taiwan) and Yung-Li Tsai (Miaoli County, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure relates to a contamination controlled semiconductor processing system. The contamination controlled semiconductor processing system includes a processing chamber, a contamination detection system, and a contamination removal system. The processing chamber is configured to process a wafer. The con...