US Patent Issued to Taiwan Semiconductor Manufacturing on Feb. 24 for "System and method for omnidirectional real time detection of photolithography characteristics" (Taiwanese Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,560,868, issued on Feb. 24, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"System and method for omnidirectional real time detection of photolithography characteristics" was invented by Tai-Yu Chen (Hsinchu, Taiwan), Shang-Chieh Chien (Hsinchu, Taiwan), Sheng-Kang Yu (Hsinchu, Taiwan), Li-Jui Chen (Hsinchu, Taiwan) and Heng-Hsin Liu (Hsinchu, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a collector and a plurality of vibration sensors coupled to the collector. The vibration sensors g...