ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,557,584, issued on Feb. 17, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).
"Semiconductor processing station and semiconductor process using the same" was invented by Chia-Wei Lu (Hsinchu, Taiwan), Hon-Lin Huang (Hsinchu, Taiwan) and Hung-Chih Wang (Hsinchu, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor processing station includes first and second chambers, and a cooling stage. The second chamber includes a cooling pipe disposed inside the second chamber, and an external pipe. The cooling pipe includes a first segment disposed along a sidewall of the second chamber, and a second segment disposed pe...