ALEXANDRIA, Va., Dec. 2 -- United States Patent no. 12,487,519, issued on Dec. 2, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).
"Reticle container" was invented by Pei-Cheng Hsu (Taipei, Taiwan), Ta-Cheng Lien (Cyonglin Township, Taiwan), Tzu Yi Wang (Hsinchu, Taiwan) and Hsin-Chang Lee (Zhubei, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A mask container for storing a mask for photolithography, includes a cover and a base having a plurality of tapered corners. The tapered corners taper outward and downward from a top major surface of the base. The cover having the tapered corners extends downward that covers the tapered corners of the base when the cover is att...