US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Aug. 4 for "Replacement sidewall spacers" (Taiwanese Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,701,766, issued on Aug. 4, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Replacement sidewall spacers" was invented by Chang-Ta Chen (Taipei, Taiwan), Ming-Chang Wen (Kaohsiung, Taiwan), Kuo-Feng Yu (Hsinchu, Taiwan), Chen-Yu Tai (Miaoli, Taiwan), Yun Lee (Taipei, Taiwan), Poya Chuang (Hsinchu, Taiwan), Chun-Ming Yang (Taipei, Taiwan), Yoh-Rong Liu (Taipei, Taiwan) and Ya-Ting Yang (Tainan, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a device with a replacement spacer structure and a method for forming such a structure. The method includes forming an initial spacer structure, wherein the initial...