US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on Aug. 25 for "Photo mask and lithography method using the same" (Taiwanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,721,115, issued on Aug. 25, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan).

"Photo mask and lithography method using the same" was invented by Bao-Chin Li (Tainan, Taiwan), Chung-Kai Huang (Tainan, Taiwan), Ko-Pin Kao (Taichung City, Taiwan) and Ching-Yen Hsaio (Tainan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photo mask includes a plurality of device features, a first assist feature, and a second assist feature. The device features are in a patterning region of a device region. The first assist feature are in the patterning region and adjacent to the device features. The first assist feature is for...