ALEXANDRIA, Va., Aug. 18 -- United States Patent no. 12,710,607, issued on Aug. 18, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan).

"Photonic semiconductor device and method of manufacture" was invented by Chen-Hua Yu (Hsinchu, Taiwan) and Jiun Yi Wu (Zhongli City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method includes forming a first redistribution structure on a first substrate; forming a waveguide structure on a second substrate, wherein the waveguide structure includes waveguides; bonding the waveguide structure to the redistribution structure using dielectric-to-dielectric bonding; removing the second substrate; forming a second redistribution structure on...